The Regional Marketing Centre
Establishment of Education
"Gomel State University named Francisk Scorina"

TECHNOLOGY OF DRAWING THIN PROTECTIVE films FROM REFRACTORY OXIDES ON PRODUCTS OF OPTICS and QUANTUM ELECTRONICS by METHODS OF LASER EVAPORATION IN VACUUM WITH HIGH partial PRESSURE OF WORKING GAS USing LASER RADIATION OF SMALL AND AVERAGE CAPACITY

Area of science-technics: optics, quantum electronics, optoelectronics and laser technics.

Technology features: the equipment and technology for drawing моnо- and multilayered protective films from refractory oxides (Al₂O₃,TiO₂, ZrO₂, SiO₂ and others) on glass, salts crystals and ceramics substrates has been developed methods of evaporation, assistant, stimulations by laser radiation of small and average capacity in conditions of vacuum with high partial pressure of working gas have been used.

Advantages and characteristics:

· using this technology it is possible to get close-packed thin protective films which are proof to moisture, hostile environments and abrasive deterioration;

· productivity increase and power inputs decrease at drawing process;

· high beam stability of coverings (p≥10⁷ v/sm²);

· high stability to temperature influences;

· the possibility to form interference clarifying infrarayed - range coverings with high beam stability.

Contacts:
Scientific-research laboratory “Physics-chemistry and technologies of micro- and nano-sized systems”.
The head, developer – Fedosenko Nikolay
Tel./fax (+375 232) 57 82 53
Email: fedosenko@gsu.by